We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Netron sputtering equipment.
ipros is IPROS GMS ・ IPROS One of the largest technical database sites in Japan that collects information on.

Netron sputtering equipment Product List and Ranking from 16 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Feb 04, 2026～Mar 03, 2026
This ranking is based on the number of page views on our site.

Netron sputtering equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Feb 04, 2026～Mar 03, 2026
This ranking is based on the number of page views on our site.

  1. 真空デバイス 本社 Ibaraki//Pharmaceuticals and Biotechnology
  2. ティー・ケイ・エス Tokyo//Industrial Machinery
  3. FKDファクトリ Tokyo//Other manufacturing
  4. 4 ハルツォク・ジャパン Tokyo//Testing, Analysis and Measurement
  5. 5 テルモセラ・ジャパン 本社 Tokyo//Industrial Electrical Equipment
Go to Company Ranking

Netron sputtering equipment Product ranking

Last Updated： Aggregation Period:Feb 04, 2026～Mar 03, 2026
This ranking is based on the number of page views on our site.

  1. Magnetron sputtering device for high-precision optical filter film deposition ティー・ケイ・エス
  2. Ultra-compact Magnetron Sputtering Device MSP-mini 真空デバイス 本社
  3. Semi-automatic grinding device for steel samples SAB-2-200 ハルツォク・ジャパン
  4. 【nanoPVD-S10A】Magnetron Sputtering Device テルモセラ・ジャパン 本社
  5. 4 HPC-20 Fully Automatic Osmium Coater 真空デバイス 本社

Netron sputtering equipment Product List

1～30 item / All 33 items

Displayed results
Research and development equipment / ultra-high vacuum equipment

Research and development equipment / ultra-high vacuum equipment

Build a reliable system! Leave maintenance and modifications to us.

Our company has been involved in vacuum technology for over 30 years, providing products tailored to user specifications primarily to research institutions. We offer a wide range of vacuum deposition equipment, including the "RF Magnetron Sputtering System," which allows for dual gas introduction, and the "Compact Vacuum Evaporation System," which enables affordable and easy thin film production. Additionally, we have various research equipment available, such as "Vacuum Chambers" and "Turbo Vacuum Pumps." Please feel free to consult us when needed. 【Features】 <Vacuum Deposition Equipment> ■ Designed with consideration for the expandability of the system ■ Engineered to be an economical system ■ Supports target sizes from simple, compact models to those exceeding 1 meter ■ Proven track record across a wide range of fields from experimentation to production *For more details, please refer to the PDF materials or feel free to contact us.

  • Evaporation Equipment
  • Sputtering Equipment
  • Vacuum Equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Ultra-compact Magnetron Sputtering Device MSP-mini

Ultra-compact Magnetron Sputtering Device MSP-mini

This is a metal coating device for optical microscope samples (transparent materials) or SEM samples. It is the smallest model in the industry. It is a super compact coating device.

The coating is done at a very low voltage using a magnetron electrode. A simple yet highly glossy metal film can be coated with just one touch. Set the sample. Set the timer according to the desired coating thickness. Once you press the start button, it automatically progresses from preliminary evacuation to coating. When the coating is complete, the RP stops and automatically air leaks.

  • Other machine tools
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device MSP-20UM

Magnetron Sputtering Device MSP-20UM

To apply a conductive film treatment to the sample for the electron microscope. Magnetron sputtering device.

The Magnetron Sputtering Device MSP-20UM is a device used for applying conductive film treatment to samples for electron microscopy. It employs a magnetron target to minimize sample damage. It is equipped with adjustment functions that allow it to accommodate various applications. It also has features for introducing and adjusting the pressure of argon gas and other gases, which contributes to improving film purity. For more details, please contact us or refer to the catalog.

  • Other FA equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device MSP-1S

Magnetron Sputtering Device MSP-1S

For SEM samples. It is a sample-friendly magnetron-type ion coater.

The Magnetron Sputtering Device MSP-1S allows for coating at low voltage and features a floating sample stage, ensuring no damage to the samples. It is a magnetron-type ion coater that is gentle on samples. Its compact size means it doesn't take up much space and can operate in a corner of your desk. For more details, please contact us or refer to the catalog.

  • Other FA equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device MSP-20TK

Magnetron Sputtering Device MSP-20TK

It is a coating device for tungsten thin films for electron microscopes.

The Magnetron Sputtering Device MSP-20-TK is a tungsten coating device for applying conductive treatment to electron microscope samples. By adopting a magnetron target, it minimizes sample damage. For more details, please contact us or refer to the catalog.

  • Plasma surface treatment equipment
  • Other surface treatment equipment
  • Other physicochemical equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Multi-film deposition device VES-10

Multi-film deposition device VES-10

Complete integration of hydrophilic treatment, deposition equipment, and ion sputtering functions.

The multi-film deposition device VES-10 is a compact tabletop unit that fully integrates hydrophilic treatment, deposition, and ion sputtering functions. It deposits replacement leads for mechanical pencils. It uses a magnetron target for low-damage sputtering. The operations for ion sputtering and hydrophilic treatment are fully automated, allowing for automatic execution from the start of evacuation to the end of coating. Function switching is easy with just one button. For more details, please contact us or refer to the catalog.

  • Other physicochemical equipment
  • Plasma surface treatment equipment
  • Other surface treatment equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
IONIX® Magnetron Sputter Source

IONIX® Magnetron Sputter Source

The unique cooling water pathway allows the entire magnetron to be cooled at a constant temperature at all times.

We handle the rectangular type 'IONIX® Magnetron Sputter Source'. It can be installed both internally and externally. Thanks to its unique cooling water pathway, the entire magnetron can be cooled to a constant temperature at all times. Additionally, it supports KF, ISO, and CF connections, and with its unique magnetic pole arrangement, it is compatible with the UMBS configuration. 【Features】 ■ Constant temperature cooling for the entire unit ■ Installable both internally and externally ■ Supports KF, ISO, and CF connections ■ Compatible with UMBS configuration due to unique magnetic pole arrangement ■ Cooling structure that does not put stress on the target, preventing deformation of the target *For more details, please refer to the PDF document or feel free to contact us.

  • Cooling system
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Three-Element Magnetron Sputtering Device 'NS-023'

Three-Element Magnetron Sputtering Device 'NS-023'

Development of new thin films using simultaneous three-source sputtering! Customizable according to experimental content and budget.

The NS-023 is a ternary magnetron sputtering device capable of simultaneously depositing three types of targets. In addition to multi-target simultaneous sputtering, it supports various applications by adopting a platinum heater for high-temperature activation of the substrate (heater temperature: 950°C) and reactive sputtering. Additionally, it can accommodate assist plasma sources (ECR, ICP, etc.). 【Features】 ■ Capable of simultaneously depositing three types of targets ■ Supports various applications beyond multi-target simultaneous sputtering ■ Customizable according to experimental content and budget ■ Compatible with assist plasma sources *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Multi-film deposition device for development: "PVD for R&D"

Multi-film deposition device for development: "PVD for R&D"

Magnetron sputtering, thermal evaporation, and EB compatible! A composite film deposition device for the development of IoT and automotive devices.

The "PVD for R&D" is a multi-layer deposition device designed for development purposes. It supports magnetron sputtering, thermal evaporation, and E-Beam. It boasts a delivery record of over 400 units worldwide. With a modular design, combinations can be customized according to your needs. 【Features】 ■ Development-focused deposition device specialized for R&D ■ Over 400 units delivered to renowned research institutes, universities, and companies ■ Combinations of magnetron sputtering, thermal evaporation, and E-Beam are possible (Combinations can also be changed through modifications) *For more details, please refer to the PDF document or feel free to contact us.

  • Other machine elements
  • Other processing machines
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Heating Sample Stage Unit 'TP-HEA-1'

Heating Sample Stage Unit 'TP-HEA-1'

The sample part is vacuumed for insulation! Heating stage unit for transmission measurement.

The "TP-HEA-1" is a heating stage unit for transmission measurements that can be mounted on the terahertz spectrometer "TeraProspector." The sample section is used under vacuum for insulation. The vacuum is manually created after the sample is set, and the unit, sealed under vacuum, is placed in the sample chamber for measurement. The temperature is monitored at the metal part that contacts the sample and controlled by an electric heater. A chiller is used for heat dissipation, circulating cooling water. 【Features】 ■ The sample section is used under vacuum for insulation. ■ The temperature is monitored at the metal part that contacts the sample. ■ A chiller and circulating cooling water are used for heat dissipation. *For more details, please refer to the PDF document or feel free to contact us.

  • Spectroscopic Analysis Equipment
  • Testing Equipment and Devices
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Polarization Measurement Sample Stage UNIT 'TP-POL-1'

Polarization Measurement Sample Stage UNIT 'TP-POL-1'

Can be mounted on a terahertz spectrometer! A stage for measuring the effects of polarization due to the sample.

The "TP-POL-1" is a stage designed to measure the effects of polarization by samples that can be mounted on the terahertz spectrometer "TeraProspector." It consists of a polarizer that cuts off components of the incident and detected signals other than the horizontal polarization component, and a sample holder that allows for the rotation of the inserted sample. 【Specifications】 ■ Model: TP-POL-1 ■ Sample rotation angle: 360° (can be set to any angle manually) ■ Extinction ratio: <10^-4 *For more details, please refer to the PDF document or feel free to contact us.

  • Spectroscopic Analysis Equipment
  • Testing Equipment and Devices
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device "LA-S2020"

Magnetron Sputtering Device "LA-S2020"

Magnetron sputtering equipment that can also be made as a film thickness electrode for various devices and sensors.

Labotech Co., Ltd.'s "LA-S2020" is a 2-inch magnetron DC sputtering device with a counter-parallel disk type. It allows for metal (Au/Pt, etc.) coating when observing non-conductive samples using a scanning electron microscope (SEM). This sputtering device can produce thin film electrodes (below 50nm) for various devices and sensors. It achieves efficient glow discharge with simple operations in a short time, enabling the production of sputtered films with excellent granularity. 【Features】 ■ Easy operation ■ High efficiency ■ Low cost *For more details, please contact us or download the catalog.

  • Other physicochemical equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Osmium coater

Osmium coater

Can coat osmium with low damage!

We handle the "Osmium Coater," a device that coats high magnification SEM samples, delicate organic materials, and samples with complex surface structures with low-resistance osmium metal (amorphous & fine particles) for conductive treatment. It adopts the "low-voltage discharge CVD method using a hollow cathode sample stage." High-density plasma is generated throughout the entire hollow cathode cylinder, allowing for uniform coating, making it recommended for those concerned about sample size or height. 【Lineup】 ■HPC-1SW 　・CH size: Inner diameter 120mm × Height 90mm 　・Sample size: φ95mm, Height 40mm ■HPC-20 　・CH size: Inner diameter 120mm × Height 77mm 　・Sample size: φ95mm, Height 45mm *For more details, please download the PDF or feel free to contact us.

  • Other electric meters
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron sputtering device for high-precision optical filter film deposition

Magnetron sputtering device for high-precision optical filter film deposition

The "FHR.Star.600-EOSS" is a high-performance magnetron sputtering device developed for precise optical filter film deposition.

We will demonstrate our capabilities in the stable production of high-performance optical filters that require multilayering and high reproducibility, such as LiDAR applications, which are expected to see significant demand in the future. - Film formation that eliminates the effects of film quality changes due to target wear using a cylindrical cathode - Stable film formation of oxide films using a reactive ion source - Film formation of a wide range of multilayer films with up to four cathodes This is a device specialized for high-quality optical thin film deposition. Features: ■ Outstanding reproducibility of optical multilayer films ■ Excellent film thickness uniformity ■ Improvement of film quality and defect-free deposition through the combination of cylindrical cathodes and sputter-up ■ Continuous monitoring of the film formation state through in-situ monitoring ■ Fully automated process control *For more details, please refer to the PDF document or feel free to contact us.

  • unnamed.jpg
  • FHR.Star.500-EOSS.jpeg
  • unnamed (1).jpg
  • unnamed (2).jpg
  • Sputtering Equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Combinatorial Magnetron Sputtering System CMS-6420

Combinatorial Magnetron Sputtering System CMS-6420

Effective area of a 25mm side triangle! It forms a composition distribution of hundreds of conditions on a single substrate.

The "CMS-6420" is a 6-component combinatorial magnetron sputtering device developed to expand the film deposition area, which has been difficult to achieve with the PLD method. The effective area is a triangle with sides of 25mm. Since it uses a 4-inch wafer as the standard substrate, it can be integrated into subsequent processes such as patterning and etching, enabling high throughput not only for film deposition but also for analysis. 【Features】 ■ Compatible with 4-inch wafers suitable for process lines ■ Effective area: triangle with sides of 25mm ■ Supports binary and ternary combinatorial film deposition ■ LabVIEW recipe input and automatic film deposition ■ Maximum 6-component configuration (6 units of 2-inch cathodes for matrix use) *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Tabletop Magnetron Sputtering Device "FDS/FRS Series"

Tabletop Magnetron Sputtering Device "FDS/FRS Series"

Reduce initial implementation costs and enable high performance through expansion! Upgrade according to the research stage.

The "FDS/FRS Series" is a tabletop magnetron sputtering device for research and development, equipped with the necessary functions. The basic specifications consist of a DC sputter/single cathode/rotary pump configuration for metal thin film sputtering. With expansion options such as RF conversion, additional cathodes, and turbo molecular pump specifications, it is possible to upgrade according to the research stage. 【Features】 ■ Keeps initial introduction costs low while allowing for high performance upgrades later ■ Comes with an MFC for argon in the basic specifications, enabling precise control of gas flow ■ Adopts a deposition-up method to prevent dust from adhering to the sample during film formation ■ Utilizes a high vacuum-sealing SUS chamber despite being a tabletop type *For more details, please refer to the PDF materials or feel free to contact us.

  • Sputtering Equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Hybrid hard film coating device (DLC-CVD + PVD device)

Hybrid hard film coating device (DLC-CVD + PVD device)

Composite coating device for CVD-DLC and hard film PVD. Smooth surface PVD film + high-rate DLC. Hardness + tribological thin film.

A high-density sputter cathode ADM system (arc discharge type magnetron sputtering cathode) has been added to the well-established PIG-type DLC coating equipment for automotive DLC films. A hard alloy film is laminated onto the DLC film, which has excellent tribological properties, achieving a new hard coating with a smooth surface. The conventional DLC film has also been enhanced with the new cathode's functions, improving performance. Adhesion and resistance to surface pressure can be easily improved. Of course, the conventional PIG-type DLC coating equipment can be upgraded with additional functions. The latest model of the new functional hard film coating equipment can fully demonstrate the performance of CVD/PVD alone.

  • Plasma surface treatment equipment
  • Other processing machines
  • Other machine tools
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Semi-automatic grinding device for steel samples SAB-2-200

Semi-automatic grinding device for steel samples SAB-2-200

Semi-automatic belt grinding device for steel sample optical emission spectroscopy (OES) pre-treatment SAB-2-200

This is a semi-automatic belt grinding machine designed for various steel samples. By simply placing the sample in the designated position and pressing the start button, it performs a complete cycle of automatic operation. It is a safe device that does not require the operator to touch the machine while it is in operation. The sample moves back and forth in a direction perpendicular to the belt rotation for grinding, and by utilizing not only the center of the belt but also both ends, it contributes to reducing running costs. Since the sample holding pressure and the number of sample reciprocations can be set arbitrarily, it is possible to change the conditions based on the material of the sample and the state of the belt.

  • Other machine tools
  • Spectroscopic Analysis Equipment
  • X-ray fluorescence analyzer
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device 'scia Magna 200'

Magnetron Sputtering Device 'scia Magna 200'

Maximum 200mm diameter substrate! Double ring magnetron (Fraunhofer FEP)

The "scia Magna 200" is a magnetron sputtering device with a rotating single magnetron. Applications include temperature compensation films (SiO2) for TC-SAW, piezoelectric films such as AlN, high and low refractive index films for optics, and insulating films (Si3N4, SiO2, Al2O3). Additionally, the process is magnetron sputtering. Please feel free to consult us when needed. 【Features】 ■ Maximum substrate diameter of 200mm ■ Rotating single magnetron (maximum diameter of 300mm) ■ Confocal 4 magnetron ■ Double ring magnetron (Fraunhofer FEP) *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Sample transport device

Sample transport device

Sample transport device

This product, the Sample Carrying System (KSC-1000), is a transport device that also serves as a sample introduction chamber. It allows for the transportation of samples while maintaining ultra-high vacuum conditions between multiple vacuum systems, making future expansion or addition of vacuum systems easy. Additionally, it comes standard with a six-slot sample transport carrier, making it ideal as a sample stocker, and the included heating mechanism enables cleaning of the sample surface.

  • Analytical Equipment and Devices
  • Other laboratory equipment and containers
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Sputter Source "Ultra High Vacuum Compatible Magnetron RF Sputter Source"

Sputter Source "Ultra High Vacuum Compatible Magnetron RF Sputter Source"

It is possible to remove the magnet while maintaining the spatter source in ultra-high vacuum.

The "Ultra High Vacuum Compatible Magnetron RF Sputter Source" is a general-purpose compact magnetron sputter source compatible with ultra high vacuum. Since the entire body is bakeable, it enables film deposition with minimal impurities even with highly reactive targets. 【Features】 - Ultra high vacuum type that does not use O-rings - The magnet can be removed while maintaining the sputter source in ultra high vacuum - Baking up to 300°C is possible by removing the magnet - Target fixation is done with a retainer, allowing for quick target replacement - The gas inlet is integrated with the mounting flange, eliminating the need for a separate flange for gas introduction For more details, please contact us or download the catalog.

  • others
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Sputter Source "Ultra High Vacuum Compatible Magnetron Sputter Source"

Sputter Source "Ultra High Vacuum Compatible Magnetron Sputter Source"

By removing the magnet, baking up to 300°C is possible.

This sputter source is a general-purpose compact magnetron sputter source compatible with ultra-high vacuum. Since the entire body is bakeable, it allows for film deposition with minimal impurities even with highly reactive targets. 【Features】 - Ultra-high vacuum type without O-rings - The magnet can be removed while maintaining the sputter source in ultra-high vacuum - Baking up to 300°C is possible by removing the magnet - The target is fixed with a retainer, allowing for quick replacement of the target - The gas inlet is integrated with the mounting flange, so a separate flange for gas introduction is unnecessary For more details, please contact us or download the catalog.

  • Vacuum Equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
【nanoPVD-S10A】Magnetron Sputtering Device

【nanoPVD-S10A】Magnetron Sputtering Device

High-performance, cost-effective RF/DC magnetron sputtering system for research and development.

High-Performance RF/DC Magnetron Sputtering Equipment ● Achievable pressure: 5 x 10^-5 Pa (*1 x 10^-4 Pascal in the fastest 30 minutes!) ● 3 x Manetron cathodes: Sequential multi-layer film, 2 sources' co-deposition ● Film uniformity ±3% ● Various options: Substrate rotation and Z-shift, substrate heating (Max 500℃), cathodes for magnetic targets, and more ◉ nanoPVD can be used for various purposes, including up to 3 sputter sources + 3 gas flow control (MFC control), RF/DC PSU upgrade (up to 2 power supplies), sequential multi-layer film, and 2 sources' co-deposition (RF/DC or DC/DC only). - Insulating films - Conductive metal films - Compounds, etc. 【Main Features】 ◉ Substrate size: Up to Φ4 inch ◉ 2" cathodes x up to 3 sources ◉ 7" touch panel for easy operation with PLC automatic process control ◉ APC automatic pressure control ◉ High-precision process control with capacitance manometer ◉ 1 Ar gas system (standard) + N2, O2 expandable up to 3 systems ◉ USB port for connection to Windows PC, allowing the creation and storage of recipes for up to 1000 layers and 50 films. Data logging on PC ◉ Other various options available

  • Sputtering Equipment
  • Evaporation Equipment
  • Other semiconductor manufacturing equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device MSP-20MT

Magnetron Sputtering Device MSP-20MT

The target is a 4-inch size that can coat large samples as they are.

The Magnetron Sputtering Device MSP-20MT is a coating device for applying conductive treatment to electron microscope samples. It uses a magnetron target to minimize sample damage. It is designed for a 4-inch target size and can process large samples or multiple samples at once. For more details, please contact us or refer to the catalog.

  • Other FA equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron sputtering device MSP-8 inch

Magnetron sputtering device MSP-8 inch

Equipped with a large-area sample stage compatible with 8-inch wafers.

The Magnetron Sputtering Device MSP-8 Inch features a magnetron target electrode and is equipped with a large-area sample stage compatible with 8-inch wafers. The variation in coating thickness is within 10%, effectively utilizing the entire stage area. Coating is done at a voltage of 500V or lower to reduce damage from ion impact. For more details, please contact us or refer to the catalog.

  • Other FA equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
HPC-20 Fully Automatic Osmium Coater

HPC-20 Fully Automatic Osmium Coater

High functionality and low price! Equipped with a touch panel full-auto coating feature, all performance has been powered up!

A new type of osmium coater for pre-treatment for electron microscope observation. We have fully automated parts that were previously difficult to operate manually. This represents a new dimension of osmium coating that allows for safer and easier operations. Equipped with a touch panel, it enables simple and clear operation. Anyone can easily create conductive films for electron microscopes. Additionally, we offer a variety of options to enhance safety and functionality. This device has been meticulously designed, yet we have achieved an astonishingly low price. If you are interested in osmium coating or have concerns about operation, please consider our osmium coater. We are also accepting requests for test coating and demonstrations at any time.

  • Other physicochemical equipment
  • Plasma surface treatment equipment
  • Plasma Generator
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device MSP-40T

Magnetron Sputtering Device MSP-40T

Multipurpose, fully automatic film deposition device for experimental use. Magnetron sputtering device MSP-40T type.

The Magnetron Sputtering Device MSP-40T is a multipurpose, multi-metal, experimental ion sputtering deposition system. It features an electrode-separated sample stage to avoid sample damage, efficient deposition with high-speed exhaust and simple operation, and offers good cost performance at a low price. As a successor to the MSP-30T, it has been upgraded with full auto-coating, a touch panel, and recipe functions. For more details, please contact us or refer to the catalog.

  • Other FA equipment
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Automatic sample stage unit 'TP-TRM-1'

Automatic sample stage unit 'TP-TRM-1'

Continuous measurement is possible without opening the sample cover! Automatic sample stage unit.

The "TP-TRM-1" is an automatic sample stage unit that can be mounted on the terahertz spectrometer "TeraProspector." By attaching six samples to the sample mounting plate installed on the stage, continuous measurement of samples can be performed without opening the sample cover. This reduces the number of times the sample cover needs to be opened, improving measurement efficiency and minimizing the influx of water vapor. Additionally, we also offer the reflective automatic sample stage unit "TP-RFL-1." 【Features】 ■ Attach six samples to the plate (One location is used for reference measurement. The number of samples can be changed as an option.) ■ Continuous measurement of samples can be performed without opening the sample cover ■ Improves measurement efficiency and minimizes the influx of water vapor *For more details, please refer to the PDF document or feel free to contact us.

  • Spectroscopic Analysis Equipment
  • Testing Equipment and Devices
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron sputtering

Magnetron sputtering

It is a device for applying a conductive film treatment to samples for electron microscopy.

The "Magnetron Sputtering Device" utilizes the principle of using a powerful magnet behind the target to promote ionization at the cathode surface layer, and by applying an electric field, it causes ions to collide with the target, releasing metal molecules. This device, manufactured by Vacuum Device Co., Ltd., is characterized by extremely low damage to samples. Additionally, we offer a variety of sputtering target types, sample sizes, and prices to meet our customers' needs. Please feel free to contact us with your requests. 【Product Lineup】 ■MSP-mini ■MSP-1S ■MSP-20-UM ■MSP-20-MT ■MSP-20-TK, etc. *For more details, please download the PDF or feel free to contact us.

  • Other electric meters
  • Netron sputtering equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration

Related Categories of Netron sputtering equipment

COPYRIGHT © 2001-2026 IPROS CORPORATION ALL RIGHTS RESERVED.