We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Netron sputtering equipment.
ipros is IPROS GMS ・ IPROS One of the largest technical database sites in Japan that collects information on.

Netron sputtering equipment Product List and Ranking from 16 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

Netron sputtering equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. テルモセラ・ジャパン 本社 Tokyo//Industrial Electrical Equipment
  2. ハルツォク・ジャパン Tokyo//Testing, Analysis and Measurement
  3. 真空デバイス 本社 Ibaraki//Pharmaceuticals and Biotechnology
  4. 4 ティー・ケイ・エス Tokyo//Electronic Components and Semiconductors
  5. 5 コメット Ibaraki//Other manufacturing
Go to Company Ranking

Netron sputtering equipment Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. 【nanoPVD-S10A】Magnetron Sputtering Device テルモセラ・ジャパン 本社
  2. Semi-automatic grinding device for steel samples SAB-2-200 ハルツォク・ジャパン
  3. HPC-20 Fully Automatic Osmium Coater 真空デバイス 本社
  4. 4 Magnetron sputtering device for high-precision optical filter film deposition ティー・ケイ・エス
  5. 5 Ultra-compact Magnetron Sputtering Device MSP-mini 真空デバイス 本社

Netron sputtering equipment Product List

1～15 item / All 33 items

Displayed results
Research and development equipment / ultra-high vacuum equipment

Research and development equipment / ultra-high vacuum equipment

Build a reliable system! Leave maintenance and modifications to us.

Our company has been involved in vacuum technology for over 30 years, providing products tailored to user specifications primarily to research institutions. We offer a wide range of vacuum deposition equipment, including the "RF Magnetron Sputtering System," which allows for dual gas introduction, and the "Compact Vacuum Evaporation System," which enables affordable and easy thin film production. Additionally, we have various research equipment available, such as "Vacuum Chambers" and "Turbo Vacuum Pumps." Please feel free to consult us when needed. 【Features】 <Vacuum Deposition Equipment> ■ Designed with consideration for the expandability of the system ■ Engineered to be an economical system ■ Supports target sizes from simple, compact models to those exceeding 1 meter ■ Proven track record across a wide range of fields from experimentation to production *For more details, please refer to the PDF materials or feel free to contact us.

  • Evaporation Equipment
  • Sputtering Equipment
  • Vacuum Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Ultra-compact Magnetron Sputtering Device MSP-mini

Ultra-compact Magnetron Sputtering Device MSP-mini

This is a metal coating device for optical microscope samples (transparent materials) or SEM samples. It is the smallest model in the industry. It is a super compact coating device.

The coating is done at a very low voltage using a magnetron electrode. A simple yet highly glossy metal film can be coated with just one touch. Set the sample. Set the timer according to the desired coating thickness. Once you press the start button, it automatically progresses from preliminary evacuation to coating. When the coating is complete, the RP stops and automatically air leaks.

  • Other machine tools

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device MSP-20UM

Magnetron Sputtering Device MSP-20UM

To apply a conductive film treatment to the sample for the electron microscope. Magnetron sputtering device.

The Magnetron Sputtering Device MSP-20UM is a device used for applying conductive film treatment to samples for electron microscopy. It employs a magnetron target to minimize sample damage. It is equipped with adjustment functions that allow it to accommodate various applications. It also has features for introducing and adjusting the pressure of argon gas and other gases, which contributes to improving film purity. For more details, please contact us or refer to the catalog.

  • Other FA equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device MSP-1S

Magnetron Sputtering Device MSP-1S

For SEM samples. It is a sample-friendly magnetron-type ion coater.

The Magnetron Sputtering Device MSP-1S allows for coating at low voltage and features a floating sample stage, ensuring no damage to the samples. It is a magnetron-type ion coater that is gentle on samples. Its compact size means it doesn't take up much space and can operate in a corner of your desk. For more details, please contact us or refer to the catalog.

  • Other FA equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device MSP-20TK

Magnetron Sputtering Device MSP-20TK

It is a coating device for tungsten thin films for electron microscopes.

The Magnetron Sputtering Device MSP-20-TK is a tungsten coating device for applying conductive treatment to electron microscope samples. By adopting a magnetron target, it minimizes sample damage. For more details, please contact us or refer to the catalog.

  • Plasma surface treatment equipment
  • Other surface treatment equipment
  • Other physicochemical equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Multi-film deposition device VES-10

Multi-film deposition device VES-10

Complete integration of hydrophilic treatment, deposition equipment, and ion sputtering functions.

The multi-film deposition device VES-10 is a compact tabletop unit that fully integrates hydrophilic treatment, deposition, and ion sputtering functions. It deposits replacement leads for mechanical pencils. It uses a magnetron target for low-damage sputtering. The operations for ion sputtering and hydrophilic treatment are fully automated, allowing for automatic execution from the start of evacuation to the end of coating. Function switching is easy with just one button. For more details, please contact us or refer to the catalog.

  • Other physicochemical equipment
  • Plasma surface treatment equipment
  • Other surface treatment equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
IONIX® Magnetron Sputter Source

IONIX® Magnetron Sputter Source

The unique cooling water pathway allows the entire magnetron to be cooled at a constant temperature at all times.

We handle the rectangular type 'IONIX® Magnetron Sputter Source'. It can be installed both internally and externally. Thanks to its unique cooling water pathway, the entire magnetron can be cooled to a constant temperature at all times. Additionally, it supports KF, ISO, and CF connections, and with its unique magnetic pole arrangement, it is compatible with the UMBS configuration. 【Features】 ■ Constant temperature cooling for the entire unit ■ Installable both internally and externally ■ Supports KF, ISO, and CF connections ■ Compatible with UMBS configuration due to unique magnetic pole arrangement ■ Cooling structure that does not put stress on the target, preventing deformation of the target *For more details, please refer to the PDF document or feel free to contact us.

  • Cooling system

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Three-Element Magnetron Sputtering Device 'NS-023'

Three-Element Magnetron Sputtering Device 'NS-023'

Development of new thin films using simultaneous three-source sputtering! Customizable according to experimental content and budget.

The NS-023 is a ternary magnetron sputtering device capable of simultaneously depositing three types of targets. In addition to multi-target simultaneous sputtering, it supports various applications by adopting a platinum heater for high-temperature activation of the substrate (heater temperature: 950°C) and reactive sputtering. Additionally, it can accommodate assist plasma sources (ECR, ICP, etc.). 【Features】 ■ Capable of simultaneously depositing three types of targets ■ Supports various applications beyond multi-target simultaneous sputtering ■ Customizable according to experimental content and budget ■ Compatible with assist plasma sources *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Multi-film deposition device for development: "PVD for R&D"

Multi-film deposition device for development: "PVD for R&D"

Magnetron sputtering, thermal evaporation, and EB compatible! A composite film deposition device for the development of IoT and automotive devices.

The "PVD for R&D" is a multi-layer deposition device designed for development purposes. It supports magnetron sputtering, thermal evaporation, and E-Beam. It boasts a delivery record of over 400 units worldwide. With a modular design, combinations can be customized according to your needs. 【Features】 ■ Development-focused deposition device specialized for R&D ■ Over 400 units delivered to renowned research institutes, universities, and companies ■ Combinations of magnetron sputtering, thermal evaporation, and E-Beam are possible (Combinations can also be changed through modifications) *For more details, please refer to the PDF document or feel free to contact us.

  • Other machine elements
  • Other processing machines

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Heating Sample Stage Unit 'TP-HEA-1'

Heating Sample Stage Unit 'TP-HEA-1'

The sample part is vacuumed for insulation! Heating stage unit for transmission measurement.

The "TP-HEA-1" is a heating stage unit for transmission measurements that can be mounted on the terahertz spectrometer "TeraProspector." The sample section is used under vacuum for insulation. The vacuum is manually created after the sample is set, and the unit, sealed under vacuum, is placed in the sample chamber for measurement. The temperature is monitored at the metal part that contacts the sample and controlled by an electric heater. A chiller is used for heat dissipation, circulating cooling water. 【Features】 ■ The sample section is used under vacuum for insulation. ■ The temperature is monitored at the metal part that contacts the sample. ■ A chiller and circulating cooling water are used for heat dissipation. *For more details, please refer to the PDF document or feel free to contact us.

  • Spectroscopic Analysis Equipment
  • Testing Equipment and Devices

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Polarization Measurement Sample Stage UNIT 'TP-POL-1'

Polarization Measurement Sample Stage UNIT 'TP-POL-1'

Can be mounted on a terahertz spectrometer! A stage for measuring the effects of polarization due to the sample.

The "TP-POL-1" is a stage designed to measure the effects of polarization by samples that can be mounted on the terahertz spectrometer "TeraProspector." It consists of a polarizer that cuts off components of the incident and detected signals other than the horizontal polarization component, and a sample holder that allows for the rotation of the inserted sample. 【Specifications】 ■ Model: TP-POL-1 ■ Sample rotation angle: 360° (can be set to any angle manually) ■ Extinction ratio: <10^-4 *For more details, please refer to the PDF document or feel free to contact us.

  • Spectroscopic Analysis Equipment
  • Testing Equipment and Devices

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron Sputtering Device "LA-S2020"

Magnetron Sputtering Device "LA-S2020"

Magnetron sputtering equipment that can also be made as a film thickness electrode for various devices and sensors.

Labotech Co., Ltd.'s "LA-S2020" is a 2-inch magnetron DC sputtering device with a counter-parallel disk type. It allows for metal (Au/Pt, etc.) coating when observing non-conductive samples using a scanning electron microscope (SEM). This sputtering device can produce thin film electrodes (below 50nm) for various devices and sensors. It achieves efficient glow discharge with simple operations in a short time, enabling the production of sputtered films with excellent granularity. 【Features】 ■ Easy operation ■ High efficiency ■ Low cost *For more details, please contact us or download the catalog.

  • Other physicochemical equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Osmium coater

Osmium coater

Can coat osmium with low damage!

We handle the "Osmium Coater," a device that coats high magnification SEM samples, delicate organic materials, and samples with complex surface structures with low-resistance osmium metal (amorphous & fine particles) for conductive treatment. It adopts the "low-voltage discharge CVD method using a hollow cathode sample stage." High-density plasma is generated throughout the entire hollow cathode cylinder, allowing for uniform coating, making it recommended for those concerned about sample size or height. 【Lineup】 ■HPC-1SW 　・CH size: Inner diameter 120mm × Height 90mm 　・Sample size: φ95mm, Height 40mm ■HPC-20 　・CH size: Inner diameter 120mm × Height 77mm 　・Sample size: φ95mm, Height 45mm *For more details, please download the PDF or feel free to contact us.

  • Other electric meters

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Magnetron sputtering device for high-precision optical filter film deposition

Magnetron sputtering device for high-precision optical filter film deposition

The "FHR.Star.600-EOSS" is a high-performance magnetron sputtering device developed for precise optical filter film deposition.

We will demonstrate our capabilities in the stable production of high-performance optical filters that require multilayering and high reproducibility, such as LiDAR applications, which are expected to see significant demand in the future. - Film formation that eliminates the effects of film quality changes due to target wear using a cylindrical cathode - Stable film formation of oxide films using a reactive ion source - Film formation of a wide range of multilayer films with up to four cathodes This is a device specialized for high-quality optical thin film deposition. Features: ■ Outstanding reproducibility of optical multilayer films ■ Excellent film thickness uniformity ■ Improvement of film quality and defect-free deposition through the combination of cylindrical cathodes and sputter-up ■ Continuous monitoring of the film formation state through in-situ monitoring ■ Fully automated process control *For more details, please refer to the PDF document or feel free to contact us.

  • unnamed.jpg
  • FHR.Star.500-EOSS.jpeg
  • unnamed (1).jpg
  • unnamed (2).jpg
  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Combinatorial Magnetron Sputtering System CMS-6420

Combinatorial Magnetron Sputtering System CMS-6420

Effective area of a 25mm side triangle! It forms a composition distribution of hundreds of conditions on a single substrate.

The "CMS-6420" is a 6-component combinatorial magnetron sputtering device developed to expand the film deposition area, which has been difficult to achieve with the PLD method. The effective area is a triangle with sides of 25mm. Since it uses a 4-inch wafer as the standard substrate, it can be integrated into subsequent processes such as patterning and etching, enabling high throughput not only for film deposition but also for analysis. 【Features】 ■ Compatible with 4-inch wafers suitable for process lines ■ Effective area: triangle with sides of 25mm ■ Supports binary and ternary combinatorial film deposition ■ LabVIEW recipe input and automatic film deposition ■ Maximum 6-component configuration (6 units of 2-inch cathodes for matrix use) *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
COPYRIGHT © 2001-2025 IPROS CORPORATION ALL RIGHTS RESERVED.